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Precision Grinding Machine for Semiconductor
| Price | $1100.00 |
|---|---|
| Min Order | 1 Piece |
| Availability | In Stock |
| Shipping From | Jiangsu, China |
| Popularity | 350 people viewed |
Diameter:
8 Inch
Speed of Working Disc:
0-600rpm, Stepless Speed Regulation
Direction of Working Disc:
Cw/Ccw
Power of Working Disc:
750W
Factory Inspection of Working Disc:
Flatness < 2um
Speed of Sample Holder:
0-50rpm, Stepless Speed Regulation
Direction of Sample Holder:
Cw/Ccw
Rotate:
Y, Adjustable
Swing:
Y, Swing Range and Speed Adjustable
Factory Inspection of Sample Holder:
Perpendicularity to The Disk <2um; Parallelism <2u
Maximum Removal Capacity:
20mm
Power Supply:
220VAC
Panel:
7-Inch Touch Screen
Wxdxh:
700X430X580mm
Weight:
57kg
Trademark:
Trojan
Transport Package:
Standard Case or Customized
Specification:
700x430x580mm
Origin:
China
Product Description
The MultiPrep™ System enables precise semiautomatic sample preparation of a wide range of materials for microscopic (optical, SEM, FIB, TEM, AFM, etc.) evaluation.
Capabilities include parallel polishing, angle polishing, site-specific polishing or any combination thereof. It provides reproducible results by eliminating inconsistencies between users, regardless of their skill.
Dual micrometers (pitch and roll) allow precise sample tilt adjustments relative to the abrasive plane. A rigid Z-indexing spindle maintains the predefined geometric orientation throughout the grinding/polishing process. Digital indicators enable quantifiable material removal, which can be monitored real-time, or preset for unattended operation. Variable speed rotation and oscillation maximize the use of the entire grinding/polishing disc and minimize artifacts. Adjustable load control expands its capability to handle a range of small (delicate) to large samples.
Front digital indicator to display real-time material removal (sample advancement), 1 µm resolution
Dual axis, micrometer controlled angular positioning of the sample (pitch and roll): +10°/-2.5° range (0.02° increments)
Full or limited automatic sample rotation with 8 speeds
Variable sample load: 0-600 g (100 g increments)
Precision spindle that indexes the sample perpendicular to the platen, and can rotate simultaneously
Rear digital indicator to display vertical positioning (static) with zeroing function, 1 µm resolution
Cam-locking system that eliminates the need for tools and allows for precise repositioning of fixtures
Designed & manufactured by Allied in the USA
Dual axis, micrometer controlled angular positioning of the sample (pitch and roll): +10°/-2.5° range (0.02° increments)
Full or limited automatic sample rotation with 8 speeds
Variable sample load: 0-600 g (100 g increments)
Precision spindle that indexes the sample perpendicular to the platen, and can rotate simultaneously
Rear digital indicator to display vertical positioning (static) with zeroing function, 1 µm resolution
Cam-locking system that eliminates the need for tools and allows for precise repositioning of fixtures
Designed & manufactured by Allied in the USA
| Model SemiPOL | ||
Working disc | Diameter | 8 inch |
| Speed | 0-600rpm,stepless speed regulation | |
| Direction | CW/CCW | |
| Power | 750W | |
| Factory inspection | Flatness < 2um | |
Sample holder | Speed | 0-50rpm,stepless speed regulation |
| Direction | CW/CCW | |
| Rotate | Y, adjustable | |
| Swing | Y, Swing range and speed adjustable | |
| Factory inspection | Perpendicularity to the disk <2um; parallelism <2um | |
| Maximum removal capacity | 20mm | |
| Electricity | Power supply | 220VAC |
| Panel | 7-inch touch screen | |
| Dimension | WxDxH | 700x430x580mm |
| Weight | 57kg | |
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