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Used Edward Molecular Pump STP-Ixa3306CV
| Price | $18749.00 |
|---|---|
| Min Order | 1 Piece |
| Availability | In Stock |
| Shipping From | Guangdong, China |
| Popularity | 400 people viewed |
Model NO.:
STP-IXA3306CV
After-sales Service:
If There Is a Problem, Provide Online Technical Su
Warranty:
If There Is a Problem, Provide Online Technical Su
Oil or Not:
Oil Free
Structure:
Jet Flow Vacuum Pump
Exhauster Method:
Entrapment Vacuum Pump
Vacuum Degree:
High Vacuum
Work Function:
Mainsuction Pump
Working Conditions:
Dry
Brand:
Edward
Edward:
Stpa2206CV
Trademark:
Edward
Transport Package:
UPS
Specification:
according product size
Origin:
Britain
HS Code:
8414909010
Product Description
Used Edward molecular pump STP-IXA3306CV
STPA2203CV TMS ISO250F Gas Inlet YT4V66001 The Edwards STPA803C turbomolecular pump is designed for semiconductor applications. Edwards' advanced rotor technology enables best-in-class performance and maximum process flexibility. The STPA803C is already in use and proven by major equipment manufacturers in the semiconductor and magnetic media industries. Applications Metal (aluminum), tungsten and dielectric (oxide) and polysilicon plasma etching (chloride, fluoride and bromide) Electron cyclotron resonance (ECR) etching Thin film deposition CVD, PECVD, ECRCVD, MOCVD Sputtering Ion implantation sources, beamline pumping end stations MBE diffusion Photoresist stripping Crystal/film growth Wafer inspection Load lock Vacuum chamber Scientific instrumentation: surface analysis, mass spectrometry, electron microscopy High energy physics: beamlines, accelerators Radiation applications: fusion systems, cyclotronsEdward molecular pump maintenance
STPA2203CV TMS ISO250F Gas Inlet YT4V66001 The Edwards STPA803C turbomolecular pump is designed for semiconductor applications. Edwards' advanced rotor technology enables best-in-class performance and maximum process flexibility. The STPA803C is already in use and proven by major equipment manufacturers in the semiconductor and magnetic media industries. Applications Metal (aluminum), tungsten and dielectric (oxide) and polysilicon plasma etching (chloride, fluoride and bromide) Electron cyclotron resonance (ECR) etching Thin film deposition CVD, PECVD, ECRCVD, MOCVD Sputtering Ion implantation sources, beamline pumping end stations MBE diffusion Photoresist stripping Crystal/film growth Wafer inspection Load lock Vacuum chamber Scientific instrumentation: surface analysis, mass spectrometry, electron microscopy High energy physics: beamlines, accelerators Radiation applications: fusion systems, cyclotronsEdward molecular pump maintenance
| Product Name | Used Edward molecular pump STP-IXA3306CV |
| Power Consumption Working Current | 12v |
| Power Consumption | 2w |
| Medium | nitrogen |
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