6 Inch Dummy Grade High Purity Semi-Insulating Silicon Carbide Wafer Price

Price $618.00 Compare
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Hangzhou HCJingRui Technology Co., Ltd.

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Profile Certified by SGS/BV
  • Zhejiang, China
  • Angel (Ms.)  
    Sales Manager
6Inch Dummy Grade
Diode, Power Electronic Components, Semiconductor
CCC, CE, RoHS
Pvt
6n
6inch Dummy Grade
Epi-Ready with Vacuum Packaging
Hpsi
P R D Grade
4h
6n
4 6 Inches etc
HC
Multi-Waferorsingle Wafer Cassette Packaging
6Inch
China
2804611900
Product Description
        Semi-insulating silicon carbide substrates are single crystal slices formed by cutting, grinding, polishing, cleaning and other processes of semi-insulating silicon carbide crystals. As an important raw material for the third-generation semiconductors, single crystal substrate slices can be made into silicon carbide-based radio frequency devices through heteroepitaxial growth and device manufacturing. They are important basic materials for the development of the third-generation semiconductor industry. In order to meet customer demand for 4,6-inch products, the company provides domestic and foreign customers with 4,6-inch semi-insulating substrate products with high cost performance in batches.

Downstream products and applications
     High-purity semi-insulated silicon carbide single crystal substrate is mainly used in 5G communication, radar system, seeker, satellite communication, aircraft and other fields, with the advantages of improving the radio frequency range, ultra-long distance recognition, anti-interference, high-speed, large-capacity information transmission and other applications, and is regarded as the most ideal substrate for the production of microwave power devices.

                                                                                                                                                                                     6Inch High Purity Semi-insulating SiC Substrate
No.ItemsUnitProductionDummy
1.Crystal Parameters
1.1Polytype--4H4H
1.2Surface orientation on-axis--<0001><0001>
1.3Surface orientation off-axis°0±0.25°0±0.25°
1.4(0004)(FWHM)arcsec≤45arcsec≤100arcsec
2. Electrical Parameters
2.1 Type--HPSIHPSI
2.2 Resistivityohm·cm≥1E8ohm·cm70% area>1E5ohm·cm
3.Mechanical Parameters
3.1Diametermm150±0.2mm150±0.2mm
3.2 Thicknessμm500±25μm500±25μm
3.3 Notch orientation°[1-100]±5°[1-100]±5°
3.4 Notch Depthmm1~1.25mm1~1.25mm
3.5 LTVμm≤3μm(10mm*10mm)≤10μm(10mm*10mm)
3.6 TTVμm≤5μm≤15μm
3.7 Bowμm-25μm~25μm-45μm~45μm
3.8 Warpμm≤35μm≤55μm
3.9(AFM) Front (Si-face) RoughnessnmRa≤0.2nm(5μm*5μm)Ra≤0.2nm(5μm*5μm)
4.Structure
4.1 Micropipe densityea/cm2≤1 ea/cm2≤10ea/cm2
4.2 Carbon inclusions densityea/cm2≤1 ea/cm2NA
4.3Hexagonal void--NoneNA
4.4Metal impuritiesatoms/cm2≤5E12NA
5. Quality
5.1 Front--SiSi
5.2 Surface Finish--CMP Si-face CMPCMP Si-face CMP
5.3 Particlesea/wafer≤60(size≥0.3μm)NA
5.4 Scratchesea/mm≤5 ,Total Length≤DiameterNA
5.5 Orange
peel/pits/stains/striations/cracks/contamination
--NoneNA
5.6Edge chips/indents/fracture--NoneNone
5.7Polytype areas--None≤30% (Cumulative area)
5.8 Front laser marking--NoneNone
6. Back Quality
6.1 Back finish--CMP C-face CMPCMP C-face CMP
6.2 Scratchesea/mm≤5 ,Total Length≤2*DiameterNA
6.3 Back defects (edge
chips/indents)
--NoneNone
6.4 Back roughnessnmRa≤0.2nm(5μm*5μm)Ra≤0.2nm(5μm*5μm)
6.5 Back laser marking--SEMI,NOTCHSEMI,NOTCH
6.6 Edge-- Chamfer Chamfer
Notes: "NA"means no request. Items not metioned may refer to SEMI-STD.
   Complete Growth-Process-Test All aspects of inspection
FAQ

 


Q: What's the way of shipping ?
A:  We accept DHL, Fedex, TNT, UPS, EMS, SF and etc.
Q: How to pay?
A:  T/T, PayPal and etc..
Q: What's the deliver time?
A:  For inventory: the delivery time is 10 workdays.   For customized products: the delivery time is 10to 25 workdays. According to the quantity.
Q: Can I customize the products based on my need?
A:  A: Yes, we can customize the specifications according to your needs.
                                                                         
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