Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
Characteristic
| Technique | Forging ,Machining | ||||||
| Status | Annealed | ||||||
| Type | Round target | ||||||
| Surface | CNC lathe surface | ||||||
| Certificate | SO9001:2015, TUV, SGS ,EN10204.3.1 | ||||||
| Application | 1. Medical:titanium alloy (Ti6Al4V-ELI F136) and cp titanium (Ti Gr.2 F67) for implants 2. Used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications | ||||||
Specifications:
| Specifications | Chromium | Chrome aluminum | Titanium | Titanium aluminum |
| Content | 99.99% | 99.99% | 99.99% | 99.99% |
| Density | 7.19cm3/g | customized | 4.5cm3/g | customized |
| Average particle size | ≤50μm | ≤50μm | ≤50μm | ≤50μm |
| Shape (Max or Minimum) | Customized | customized | customized | customized |
| Sintering technology | Hot isostatic pressure | hot isostatic pressure | hot isostatic pressure | hot isostatic pressure |
| Oxygen content | ≤150ppm | ≤150ppm | ≤100ppm | ≤100ppm |


We provide target materials in this type:
| Cylindrical Sputtering Target Material | Arc Target Material Discs |
| Titaninum | Titaninum |
| - | TiAlSi |
| - | TiAl |
| - | Graphite |
| Silicon (3mm thickness for the silicon, with stainless steel core) | - |
| - | CrAl |
| - | Zirconium |
| Chrome | Chrome |
| Aluminum | Aluminum |
| - | AlCrSi |

Inquiry Guide:
The PVD coating machine can be used for different materials and industries. In order to recommend you the appropriate machine, we need your help on telling us:
What size of target material?
What purity?








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