Audited Supplier
Good price Cerium Oxide Glass Polishing Powder
Specifications of Cerium Oxide Glass Polishing Powder:
*Appearance: white powder
*Code: REP-05
*TREO: ≥ 95%
*CeO2/TREO: 70±5%
*La2O3/TREO : 30±5%
*Pr6O11/TREO : <0.01%
*F: 3-7%
*PH: 7
*Particle size: D50: 2.0±0.3 μm, D100<10μm
| Code | TREO | CeO2 | La2O3 | Pr6O11 | D50(μm) | D100(μm) | Color | F(%) | PH |
| REP-01 | ≥95% | 70±5% | 30±5% | <0.01% | 0.6±0.2 | <5 | White | 3-7 | 7 |
| REP-02 | ≥95% | 70±5% | 30±5% | <0.01% | 1.0±0.2 | <6 | White | 3-7 | 7 |
| REP-03 | ≥95% | 70±5% | 30±5% | <0.01% | 1.3±0.3 | <7 | White | 3-7 | 7 |
| REP-04 | ≥95% | 70±5% | 30±5% | <0.01% | 1.5±0.3 | <8 | White | 3-7 | 7 |
| REP-05 | ≥95% | 70±5% | 30±5% | <0.01% | 2.0±0.3 | <10 | White | 3-7 | 7 |
| REP-06 | ≥95% | 70±5% | 30±5% | <0.01% | 2.8±0.4 | <12 | White | 3-7 | 7 |
| REP-11 | ≥95% | 65±5% | 30±5% | 1%~5% | 0.6±0.2 | <5 | Red | 3-7 | 7 |
| REP-12 | ≥95% | 65±5% | 30±5% | 1%~5% | 1.0±0.2 | <6 | Red | 3-7 | 7 |
| REP-13 | ≥95% | 65±5% | 30±5% | 1%~5% | 1.3±0.3 | <7 | Red | 3-7 | 7 |
| REP-14 | ≥95% | 65±5% | 30±5% | 1%~5% | 1.5±0.3 | <8 | Red | 3-7 | 7 |
| REP-15 | ≥95% | 65±5% | 30±5% | 1%~5% | 2.0±0.3 | <10 | Red | 3-7 | 7 |
| REP-16 | ≥95% | 65±5% | 30±5% | 1%~5% | 2.8±0.4 | <12 | Red | 3-7 | 7 |
| REP-21 | ≥98% | ≥99.95% | <0.03% | <0.01% | 0.6±0.2 | <5 | White | 0 | 7 |
| REP-22 | ≥98% | ≥99.95% | <0.03% | <0.01% | 1.0±0.2 | <6 | White | 0 | 7 |
| REP-23 | ≥98% | ≥99.95% | <0.03% | <0.01% | 1.5±0.3 | <8 | White | 0 | 7 |
| REP-24 | ≥98% | ≥99.95% | <0.03% | <0.01% | 2.0±0.3 | <10 | White | 0 | 7 |
| REP-25 | ≥98% | ≥99.95% | <0.03% | <0.01% | 3.0±0.5 | <15 | White | 0 | 7 |
| REP-26 | ≥98% | ≥99.95% | <0.03% | <0.01% | 4.0±0.5 | <20 | White | 0 | 7 |
Application of Cerium Oxide polishing powder :
1. For precision polishing of larger flat crystal and diamond products.
2. For the polishing of optical components and mobile covers with general precision requirements.
3. For the polishing of mobile phone covers, flat glass or optical glass with higher precision requirements. For example, the polishing of glass substrates for TFT-LCD.
4. For the precision polishing of optical components, silicon wafers and large glass covers with high precision requirements.
5. For the polishing of large flat glass, silicon wafers and optical glass with higher precision requirements.
6. For precision polishing of optical components with high precision requirements, or polishing of large LCD screen.
