Titanium Nitride Coating Equipment PVD Vacuum Chroming Chamber

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Xiangtan Hondson Coating Technology Co., Ltd.

VIP   Audited Supplier 2 years
Profile Certified by SGS/BV
Engineers Can Be Sent to The Worksite
1 Year
Coating Production Line
Vacuum Coating
Steel
New
Automatic
Physical Vapor Deposition
Magnetron Sputtering
Customers Local Voltage
Provided
Functional Coatings or Decorative Coatings
Provided
Manufacturing Plant, PVD Coating Service Provider
Hipims, DC, Mf, RF
Multi Power
Hondson VAC
Export Standard Packing
Customized
Hunan, China
8543300090
Product Description

Titanium Nitride Coating Equipment PVD Vacuum Chroming Chamber

 

 

The coating equipment is a reasonable structure, coating evenly into good-quality, pumping speed, the cycle of short, high efficiency and easy operation, low energy consumption and performance advantages of stability. Widely used in automotive, audio and various small appliances, computers, clocks and watches, toys, cell phones, reflective Cup, cosmetics, toys and other industries.

Magnetron Sputtering

Material involved: plastic, metal, glass, ceramic, carbon fiber

DC magnetron sputtering coating equipment is usually used for:

Automotive lights, automotive wheels, solar collectors, conductive films, shielding films, ITO glass, glass silver mirrors, plastic products such as chrome, titanium and other metal and metal compound coatings, can also be used to deposit PVD hard film On gears, twist drills, taps, molds

 

Unbalanced magnetron sputtering coating equipment is usually used for plating various colors, carbon golf clubs on metal, metal and ceramic products

Magnetron sputtering is a kind of PVD technology which can apply different kind of metal coatings on susbtrates with a sputtering cathode. This machine is capable to work with different raw materials such as plastic, metal, ceramic, glass.

 

Both of batch type and continuous inline sputtering system are available for different applications.

The coatings made by sputtering is good quality than it made by thermal evaporation. Argon gas is required to introduce into the vacuum chamber for the process.

 

We provide different types of sputtering cathodes: DC sputtering, unbalanced sputtering cathode. We provide the complete machine, also the cathodes which are designed according to your requirements.

Maximum loading size:                   We design the vacuum chamber size and loading fixture                                                                    according to customer requirements


Vacuum chamber type:                   Vertical


Vacuum chamber material:             Stainless steel or carbon steel


Applicable substrate material:        PC, PET, PP, PE, etc.


PVD technology:                              DC magnetron sputtering or unbalanced sputtering


Extraction speed:                            8min can reach 0.05Pa


Vacuum system:                             Turbo molecular pump or diffusion pump + roots pump +                                                                    mechanical pump


Processing cycle:                            It takes less than 15 minutes to complete the process from                                                                substrate placement, sputtering, and removal. It also varies                                                              according to different processes.


Reflectivity:                                     85% or more


Sputtering chamber:                      High utilization sputtering cathode


Sputtering power type:                  DC or unbalanced sputtering power


Sputtering materials:                     Aluminum, copper, titanium, stainless steel, silver, etc.                                                                       according to customer process requirements


Process gas:                                   Argon, nitrogen, oxygen, acetylene, etc

Company Information

 


 



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