Audited Supplier
DK
at Least One Year
Tile Gold Film Vacuum Plating Machine
Electric
220V, 380V, Customized Definition
SUS 304
24h, Remote Guidance
Automatic, Manual, PLC
Vertical Type
PVD Machine
Pumps, Targets, Power Supply Available
Danko
Wood Case, Container
1600*1500mm
Ningbo, China
8479899990
Product Description
Titanium Nitride Magnetron Sputtering PVD Vacuum Coating Machine
[PVD]
Physical Vapor Deposition: Vacuum deposition methods which can be used to deposit thin films and coatings.
Description
Multi-arc Ion Sputtering Coating Machine is high performing and easy operating, equipped with arc sputtering system.
Substrate Material: Glass, Metal, Ceramics Glass, Metal (carbon steel, stainless steel, brass), Ceramics, Plastic, jewelry.
Recommend Machine: Multi Arc Magnetron Sputtering Plating Machine
Structure Type: Vertical structure, #304 Stainless Steel
A. Coating Film: Multi-functional metal film, composite film, transparent conductive film, reflectance-increasing film, electromagnetic shielding film, decorative film
B. Film Color: gold, rose gold, silver, colorful, sapphire blue, gun black, brown, dark black, etc
C. Film type: TiN, CrN, ZrN, TiCN, TiCrN, TiNC, TiALN and DLC
D. Consumables in production: Titanium, Chromium, Zirconium
Process
Application
A. Watch industry, such as watch belt, watchcase, dial etc.
B. Hardware, such as sanitary ware, door handle, door locks
C. Construction industry, such as stainless steel plate, stair handrail, columns
D. Phone shell, parts
E. Jewelry, eyeglasses frame
F. Glassware, such as glass cup, glass lamps, glass artworks
G. Table wares, like metal forks and knives.
H. Golf wares, like golf head, golf pole and golf balls.
I. Sanitary Products/bathroom wares
J. Large size sheet, plate, pipe, tube and so on. Like large stainless steel plate and furnitures.
Advantages
A. Pumps:
Mechanical pump + roots pump + diffusion pump + holding pump (or optional: cryogenic pump, cryogenic pump system)
B. Gas System: 1-4 path
C. Limited Vacuum: 6*10-4 pa (cleanroom, no-loading)
D. Targets: arc 6-18sets, magnetron target 1-2sets
E. Power Sources: DC power supply, Medium frequency power supply, medium frequency power supply, heater supply, activation power supply, pulsed bias voltage power supply
F. Targets: DC Magnetic Target, Medium Twin Target, Plane Target
H. Gas Time : 5*10-4 pa, within 30mins
I. Controlled by Manual, Semi-automatic, Full automatic, PLC
Workshop
For more details on configurations quotations, please contact us.
[PVD]
Physical Vapor Deposition: Vacuum deposition methods which can be used to deposit thin films and coatings.
Description
Multi-arc Ion Sputtering Coating Machine is high performing and easy operating, equipped with arc sputtering system.
Substrate Material: Glass, Metal, Ceramics Glass, Metal (carbon steel, stainless steel, brass), Ceramics, Plastic, jewelry.
Recommend Machine: Multi Arc Magnetron Sputtering Plating Machine
Structure Type: Vertical structure, #304 Stainless Steel
A. Coating Film: Multi-functional metal film, composite film, transparent conductive film, reflectance-increasing film, electromagnetic shielding film, decorative film
B. Film Color: gold, rose gold, silver, colorful, sapphire blue, gun black, brown, dark black, etc
C. Film type: TiN, CrN, ZrN, TiCN, TiCrN, TiNC, TiALN and DLC
D. Consumables in production: Titanium, Chromium, Zirconium
Process
Application
A. Watch industry, such as watch belt, watchcase, dial etc.
B. Hardware, such as sanitary ware, door handle, door locks
C. Construction industry, such as stainless steel plate, stair handrail, columns
D. Phone shell, parts
E. Jewelry, eyeglasses frame
F. Glassware, such as glass cup, glass lamps, glass artworks
G. Table wares, like metal forks and knives.
H. Golf wares, like golf head, golf pole and golf balls.
I. Sanitary Products/bathroom wares
J. Large size sheet, plate, pipe, tube and so on. Like large stainless steel plate and furnitures.
Advantages
A. Pumps:
Mechanical pump + roots pump + diffusion pump + holding pump (or optional: cryogenic pump, cryogenic pump system)
B. Gas System: 1-4 path
C. Limited Vacuum: 6*10-4 pa (cleanroom, no-loading)
D. Targets: arc 6-18sets, magnetron target 1-2sets
E. Power Sources: DC power supply, Medium frequency power supply, medium frequency power supply, heater supply, activation power supply, pulsed bias voltage power supply
F. Targets: DC Magnetic Target, Medium Twin Target, Plane Target
H. Gas Time : 5*10-4 pa, within 30mins
I. Controlled by Manual, Semi-automatic, Full automatic, PLC
Workshop
For more details on configurations quotations, please contact us.
