Negotiable
1 unit (MOQ)
Galvanized Steel Wire Making Equipment Supplier
Wuxi Xinrun Industrial Furnace Co., Ltd.
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Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
| Price | $1500.00 |
|---|---|
| Min Order | 1 Piece |
| Availability | In Stock |
| Shipping From | Hunan, China |
| Popularity | 524 people viewed |
Model NO.:
Non
After-sales Service:
Engineers Can Be Sent to The Worksite
Warranty:
1 Year
Type:
Coating Production Line
Coating:
Vacuum Coating
Substrate:
Steel
Certification:
CE
Condition:
New
Involved Techniques:
Sputtering and Arc Ion Plating
Shape:
Tubes or Discs, and Can Be Plates
Size:
Cusomized
Powder or Not:
Not Powder
Grade:
Ti,Tialsi,Tial,Graphite,Zirconium,Cr,Al,Alcrsi,Si
Technique:
Forging ,Machining
Ti Content (%):
>99.99%
Application:
PVD, CVD, Vacuum Coating
Processing Service:
Cutting
Trademark:
Hondson VAC
Transport Package:
Standard Export Packing
Specification:
Customized
Origin:
China
HS Code:
8543309090
Product Description
Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
Characteristic
| Technique | Forging ,Machining | ||||||
| Status | Annealed | ||||||
| Type | Round target | ||||||
| Surface | CNC lathe surface | ||||||
| Certificate | SO9001:2015, TUV, SGS ,EN10204.3.1 | ||||||
| Application | 1. Medical:titanium alloy (Ti6Al4V-ELI F136) and cp titanium (Ti Gr.2 F67) for implants 2. Used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications | ||||||
Specifications:
| Specifications | Chromium | Chrome aluminum | Titanium | Titanium aluminum |
| Content | 99.99% | 99.99% | 99.99% | 99.99% |
| Density | 7.19cm3/g | customized | 4.5cm3/g | customized |
| Average particle size | ≤50μm | ≤50μm | ≤50μm | ≤50μm |
| Shape (Max or Minimum) | Customized | customized | customized | customized |
| Sintering technology | Hot isostatic pressure | hot isostatic pressure | hot isostatic pressure | hot isostatic pressure |
| Oxygen content | ≤150ppm | ≤150ppm | ≤100ppm | ≤100ppm |
We provide target materials in this type:
| Cylindrical Sputtering Target Material | Arc Target Material Discs |
| Titaninum | Titaninum |
| - | TiAlSi |
| - | TiAl |
| - | Graphite |
| Silicon (3mm thickness for the silicon, with stainless steel core) | - |
| - | CrAl |
| - | Zirconium |
| Chrome | Chrome |
| Aluminum | Aluminum |
| - | AlCrSi |
Packing:
Inquiry Guide:
The PVD coating machine can be used for different materials and industries. In order to recommend you the appropriate machine, we need your help on telling us:
What size of target material?
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