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Sputtering Target: Titanium Sputtering / Arc Target with Different Materials

Price Negotiable
Min Order 1 Piece
Availability In Stock
Shipping From Guangdong, China
Popularity 441 people viewed
Model NO.:
Square, Round, Rotary, particle, silk, Customized
Type:
Sputtering Target Titanium
Application:
Vacuum Coating
Technique:
Forged
Grade:
GR2
Shape:
Square, Round, Rotary,Particle, Silk ,Customized
Trademark:
szzzyj
Transport Package:
Wooden Case
Specification:
According drawing
Origin:
China
Product Description
Product Description

Products attributes of Ti sputtering target
 

NameMetal Titanium Sputtering Target (Ti Target)
MaterialTitanium Metal Materials
Purity99.9%-99.995%, 3N,3N5,4N,4N5
SizeD50.8x3mm, 2inch,3inch,Or As Request
ColorMetallic Color
ShapePlanar/Round/Plate/Rotary/Bar , As Request.
SurfacePolished Surface
Ti Density4.54g/cm3
Ti Melting Point1668°C
ApplicationPVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related ItemAl,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
NoteSupport customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Item Name

High purity titanium (Ti) target

Purity

99.9%~99.999%,Grade1 to Grade 5

Shape

Square/Round, According to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.

 

Quality Standard (99.999% Ti)

Element

Value(<ppm)

Element

Value (<ppm)

Element

Value(<ppm)

Ag

0.05

Al

0.11

As

0.03

Au

0.05

B

0.01

Ba

0.005

Be

0.005

Bi

0.01

Br

0.05

Ca

0.2

Cd

0.05

Ce

0.005

Hg

0.1

Fe

3.2

Ga

0.05

I

0.01

Ge

0.05

Hf

0.01

The following table is a component analysis certificate for  5N Ti sputtering target. The analytical methods used are: 
1. Analysis of metal elements using GDMS or ICP-OES; 
2. Gas element analysis using LECO.
 

ElementsActualSpecUnitsElementsActualSpecUnitsElementsActualSpecUnits
Li<0.005 ppmZn<0.02 ppmPr<0.005 ppm
B<0.01 ppmGa<0.05 ppmNd<0.005 ppm
F<0.05 ppmBr<0.05 ppmSm<0.005 ppm
Na<0.01 ppmAs<0.05 ppmEu<0.005 ppm
Mg<0.01 ppmSe<0.05 ppmRu<0.01 ppm
Al0.59 ppmZr0.34 ppmRh<0.05 ppm
Si0.16 ppmNb<0.2 ppmGd<0.005 ppm
P<0.01 ppmMo<0.05 ppmTb<0.005 ppm
Cl0.05 ppmPd<0.01 ppmCd<0.05 ppm
K<0.01 ppmAg<0.02 ppmBe<0.005 ppm
Ca<0.5 ppmSn<0.05 ppmSc<0.05 ppm
TiMatrix wt%Sb<0.05 ppmRb<5 ppm
V0.03 ppmBa<0.005 ppmYb<0.005 ppm
Tasource ppmDy<0.005 ppmLu<0.005 ppm
W<0.01 ppmHo<0.005 ppmAu<0.05 ppm
Pt<0.05 ppmBi<0.01 ppmHg<0.1 ppm
Ti<0.01 ppmTh<0.0001 ppmHf<0.01 ppm
Pb<0.01 ppmU<0.0001 ppmIr<0.01 ppm
Re<0.01 ppmEr<0.005 ppmCe<0.005 ppm
Os<0.01 ppmTm<0.005 ppmC<5 ppm
Cr0.73 ppmIn<0.05 ppmS0.45 ppm
Mn1 ppmTe<0.05 ppmO270 ppm
Fe7.7 ppmI<0.05 ppmN5 ppm
Co<0.005 ppmCs<0.01 ppmH<1 ppm
Ni0.05 ppmLa<0.005 ppm    
Cu0.58 ppmGe<0.005 ppm    
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