Edwards A54731958r Po41 A2203 Lvs Pump ISO250f Kf40 Pump

STPA2203CV TMS ISO250F Gas Inlet YT4V66001 The Edwards STPA803C turbomolecular pump is designed for semiconductor applications. Edwards' advanced rotor technology enables best-in-class performance and maximum process flexibility. The STPA803C is already in use and proven by major equipment manufacturers in the semiconductor and magnetic media industries. Applications Metal (aluminum), tungsten and dielectric (oxide) and polysilicon plasma etching (chloride, fluoride and bromide) Electron cyclotron resonance (ECR) etching Thin film deposition CVD, PECVD, ECRCVD, MOCVD Sputtering Ion implantation sources, beamline pumping end stations MBE diffusion Photoresist stripping Crystal/film growth Wafer inspection Load lock Vacuum chamber Scientific instrumentation: surface analysis, mass spectrometry, electron microscopy High energy physics: beamlines, accelerators Radiation applications: fusion systems, cyclotrons