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GeTeSnIn Target Getesbin Germanium Antimony Telluride Indium Alloy Target for Memory Chips/Integrated Circuits

317

GeTeSnIn Target Getesbin Germanium Antimony Telluride Indium Alloy Target for Memory Chips/Integrated Circuits

ZnTe Target Zinc Telluride Ceramic Target for Semiconductor

333

ZnTe Target Zinc Telluride Ceramic Target for Semiconductor

99.99% Platinum Vacuum Coating Sputtering Target 8 Inch

282

99.99% Platinum Vacuum Coating Sputtering Target 8 Inch

3-5mm Chromium Particles Cr Granule with a Minimum Content of 99.95%

505

3-5mm Chromium Particles Cr Granule with a Minimum Content of 99.95%

SnO2 Target Tin Oxide Ceramic Target for Semiconductor

481

SnO2 Target Tin Oxide Ceramic Target for Semiconductor

Titanium Aluminum Alloy Targets/Titanium Sputtering Targets/Tial Alloy Target

483

Titanium Aluminum Alloy Targets/Titanium Sputtering Targets/Tial Alloy Target

Nb2O5 Target Nb2Ox Niobium Oxide Ceramic Target for Optical Thin Film Coating/Semiconductor

354

Nb2O5 Target Nb2Ox Niobium Oxide Ceramic Target for Optical Thin Film Coating/Semiconductor

High Purity 99.999% Titanium Sputtering Coatingtarget

451

High Purity 99.999% Titanium Sputtering Coatingtarget

99.999%High Pure Copper Target (4N-6N) Copper Plate Copper Sputtering Coating Target

407

99.999%High Pure Copper Target (4N-6N) Copper Plate Copper Sputtering Coating Target

AlNd Target Aluminium Neodymium Alloy Sputtering Target for LCD/Touch Panel

422

AlNd Target Aluminium Neodymium Alloy Sputtering Target for LCD/Touch Panel

Titanium Aluminum Alloy Sputtering Coating Target Tial Alloy Target, Ticr Alloy Target, Alloy Target

349

Titanium Aluminum Alloy Sputtering Coating Target Tial Alloy Target, Ticr Alloy Target, Alloy Target

Xinkang High Purity 99.99% Hzo (HfO2/ZrO2) Ceramic Sputtering Target for Vacuum Coating

455

Xinkang High Purity 99.99% Hzo (HfO2/ZrO2) Ceramic Sputtering Target for Vacuum Coating

99.99% High Purity Chromium Target Coating Material

417

99.99% High Purity Chromium Target Coating Material

Ta Target Tantalum Sputtering Target/Tantalum Rotary Target for Semiconductor

367

Ta Target Tantalum Sputtering Target/Tantalum Rotary Target for Semiconductor

Cr Target Chromium Sputtering Target for Decoration Film Coating

496

Cr Target Chromium Sputtering Target for Decoration Film Coating

High Purity Gold Sputtering Target Material Custom Processing

253

High Purity Gold Sputtering Target Material Custom Processing

Nb Target Niobium Sputtering Target for LCD/Optical Thin Film Coating

344

Nb Target Niobium Sputtering Target for LCD/Optical Thin Film Coating

Nickel Target 99.99 High Purity Sputtering Plane Target

300

Nickel Target 99.99 High Purity Sputtering Plane Target

High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target

488

High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target

High-Quality Nickel Chromium Alloy Sputtering Target for Coating

478

High-Quality Nickel Chromium Alloy Sputtering Target for Coating

Al Target Aluminium Sputtering Target/Aluminium Rotary Target for Integrated Circuits/LCD

229

Al Target Aluminium Sputtering Target/Aluminium Rotary Target for Integrated Circuits/LCD

High Quality Titanium Aluminum Alloy Cathode Magnetron Sputtering Target

441

High Quality Titanium Aluminum Alloy Cathode Magnetron Sputtering Target

Zrb2 Sputtering Target Zirconium Boride Magnetron Sputter Target From Xinkang Supplier

272

Zrb2 Sputtering Target Zirconium Boride Magnetron Sputter Target From Xinkang Supplier

Ti Target Titanium Sputtering Target / Titanium Rotary Target for Semiconductor /Vacuum Coating Sputtering

391

Ti Target Titanium Sputtering Target / Titanium Rotary Target for Semiconductor /Vacuum Coating Sputtering

High Purity Silicon Nitride Target Material

348

High Purity Silicon Nitride Target Material

Magnetron Sputtering Ruthenium Target High Purity

415

Magnetron Sputtering Ruthenium Target High Purity

In2O3+Cu Ceramic Target Indium Oxide+Cuprum Ceramic Sputtering Target for LCD/Touch Panel

431

In2O3+Cu Ceramic Target Indium Oxide+Cuprum Ceramic Sputtering Target for LCD/Touch Panel

High Purity 99.99% Re Rhenium Sputtering Target, Re Metal Round Target

431

High Purity 99.99% Re Rhenium Sputtering Target, Re Metal Round Target

High Purity 99.95% Zirconium Sputtering Target for Advanced Coatings Zr Target

328

High Purity 99.95% Zirconium Sputtering Target for Advanced Coatings Zr Target

X Ray Tube Insert Stationary Anode Copper Tungsten Bonding

503

X Ray Tube Insert Stationary Anode Copper Tungsten Bonding

CuNiTi Alloy Target Copper Nickel Titanium Alloy Sputtering Target for LCD/Touch Panel

447

CuNiTi Alloy Target Copper Nickel Titanium Alloy Sputtering Target for LCD/Touch Panel

Premium Rotary Silicon Tube Target with 99.999% Purity for Industrial Silicon Target

292

Premium Rotary Silicon Tube Target with 99.999% Purity for Industrial Silicon Target

Tungsten-Rhenium Sputtering Target, X-ray Tube Anode Rotating Target

292

Tungsten-Rhenium Sputtering Target, X-ray Tube Anode Rotating Target

99.95% Chromium Granules Cr Granulate for Vacuum Coating

273

99.95% Chromium Granules Cr Granulate for Vacuum Coating

Xinkang High Purity Nickel Alloy Targets Nickel Vanadium Niv7% Sputtering Targets

489

Xinkang High Purity Nickel Alloy Targets Nickel Vanadium Niv7% Sputtering Targets

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