311

• GeTeSnIn Target Getesbin Germanium Antimony Telluride Indium Alloy Target for Memory Chips/Integrated Circuits

325

• ZnTe Target Zinc Telluride Ceramic Target for Semiconductor

275

• 99.99% Platinum Vacuum Coating Sputtering Target 8 Inch

499

• 3-5mm Chromium Particles Cr Granule with a Minimum Content of 99.95%

474

• SnO2 Target Tin Oxide Ceramic Target for Semiconductor

476

• Titanium Aluminum Alloy Targets/Titanium Sputtering Targets/Tial Alloy Target

350

• Nb2O5 Target Nb2Ox Niobium Oxide Ceramic Target for Optical Thin Film Coating/Semiconductor

444

• High Purity 99.999% Titanium Sputtering Coatingtarget

400

• 99.999%High Pure Copper Target (4N-6N) Copper Plate Copper Sputtering Coating Target

415

• AlNd Target Aluminium Neodymium Alloy Sputtering Target for LCD/Touch Panel

339

• Titanium Aluminum Alloy Sputtering Coating Target Tial Alloy Target, Ticr Alloy Target, Alloy Target

449

• Xinkang High Purity 99.99% Hzo (HfO2/ZrO2) Ceramic Sputtering Target for Vacuum Coating

411

• 99.99% High Purity Chromium Target Coating Material

360

• Ta Target Tantalum Sputtering Target/Tantalum Rotary Target for Semiconductor

491

• Cr Target Chromium Sputtering Target for Decoration Film Coating

248

• High Purity Gold Sputtering Target Material Custom Processing

338

• Nb Target Niobium Sputtering Target for LCD/Optical Thin Film Coating

296

• Nickel Target 99.99 High Purity Sputtering Plane Target

480

• High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target

472

• High-Quality Nickel Chromium Alloy Sputtering Target for Coating

225

• Al Target Aluminium Sputtering Target/Aluminium Rotary Target for Integrated Circuits/LCD

435

• High Quality Titanium Aluminum Alloy Cathode Magnetron Sputtering Target

265

• Zrb2 Sputtering Target Zirconium Boride Magnetron Sputter Target From Xinkang Supplier

385

• Ti Target Titanium Sputtering Target / Titanium Rotary Target for Semiconductor /Vacuum Coating Sputtering

343

• High Purity Silicon Nitride Target Material

405

• Magnetron Sputtering Ruthenium Target High Purity

426

• In2O3+Cu Ceramic Target Indium Oxide+Cuprum Ceramic Sputtering Target for LCD/Touch Panel

425

• High Purity 99.99% Re Rhenium Sputtering Target, Re Metal Round Target

319

• High Purity 99.95% Zirconium Sputtering Target for Advanced Coatings Zr Target

494

• X Ray Tube Insert Stationary Anode Copper Tungsten Bonding

440

• CuNiTi Alloy Target Copper Nickel Titanium Alloy Sputtering Target for LCD/Touch Panel

279

• Premium Rotary Silicon Tube Target with 99.999% Purity for Industrial Silicon Target

280

• Tungsten-Rhenium Sputtering Target, X-ray Tube Anode Rotating Target

262

• 99.95% Chromium Granules Cr Granulate for Vacuum Coating

478

• Xinkang High Purity Nickel Alloy Targets Nickel Vanadium Niv7% Sputtering Targets