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V2O5 Target Vanadium Oxide Ceramic Target For LCD

491

V2O5 Target Vanadium Oxide Ceramic Target For LCD

U-Spring Tial Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

311

U-Spring Tial Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

U-Spring Zrox Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

315

U-Spring Zrox Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

PZT Ceramic Sputtering Target for Integrated Circuits Chips

240

PZT Ceramic Sputtering Target for Integrated Circuits Chips

U-Spring Ti Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

352

U-Spring Ti Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

U-Spring Cu Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

508

U-Spring Cu Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

High Purity Cupric Oxide Sputtering Target for Semiconductor

312

High Purity Cupric Oxide Sputtering Target for Semiconductor

U-Spring Ti Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

251

U-Spring Ti Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

In Target Indium Sputtering Target for LCD/Touch Panel

232

In Target Indium Sputtering Target for LCD/Touch Panel

U-Spring Cr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

376

U-Spring Cr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

99.999% Pure Copper Granules High Purity Irregular Size Copper Pieces

312

99.999% Pure Copper Granules High Purity Irregular Size Copper Pieces

ITO Target High Density>99.8% Low Density: 60% Indium Tin Oxide Sputtering Tagret for LCD/LED Touch Panel

309

ITO Target High Density>99.8% Low Density: 60% Indium Tin Oxide Sputtering Tagret for LCD/LED Touch Panel

U-Spring Tiox Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

271

U-Spring Tiox Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

4n 99.99% High Purity Si Silicon Rotary Sputtering Target for Vacuum Coating

403

4n 99.99% High Purity Si Silicon Rotary Sputtering Target for Vacuum Coating

GeSbTe Alloy Target Germanium Antimony Telluride Alloy Target for Memory Chips/Integrated Circuits

373

GeSbTe Alloy Target Germanium Antimony Telluride Alloy Target for Memory Chips/Integrated Circuits

U-Spring Nb2ox Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

247

U-Spring Nb2ox Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

AlTi Alloy Target Aluminium Titanium Alloy Sputtering Target for Integrated Circuits/Vacuum Coating

447

AlTi Alloy Target Aluminium Titanium Alloy Sputtering Target for Integrated Circuits/Vacuum Coating

U-Spring Chromium /Cr Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

354

U-Spring Chromium /Cr Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Te Target Tellurium Sputtering Target for Solar Photovoltaics

245

Te Target Tellurium Sputtering Target for Solar Photovoltaics

U-Spring Sial Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

335

U-Spring Sial Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Al2O3 Target Aluminium Oxide Ceramic Target for Integrated Circuits

387

Al2O3 Target Aluminium Oxide Ceramic Target for Integrated Circuits

U-Spring Si Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

273

U-Spring Si Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

C Target Carbon Sputtering Target/Pyrolytic Carbon Sputtering Target for Optical Thin Film Coating/Semiconductor

491

C Target Carbon Sputtering Target/Pyrolytic Carbon Sputtering Target for Optical Thin Film Coating/Semiconductor

Supply Blackened Mo Rhenium Tungsten Rotary Anode Sputtering Target

505

Supply Blackened Mo Rhenium Tungsten Rotary Anode Sputtering Target

99.999% Pure Gold Sputter Target for Magnetron Sputtering System

349

99.999% Pure Gold Sputter Target for Magnetron Sputtering System

Mo Target Molybdenum Sputtering Target for LCD/Integrated Circuits

318

Mo Target Molybdenum Sputtering Target for LCD/Integrated Circuits

Ni Target Nickel Sputtering Target for Semiconductor

405

Ni Target Nickel Sputtering Target for Semiconductor

99.9999%Single Crystal Silicon Target (Si target, SiO2, target)

488

99.9999%Single Crystal Silicon Target (Si target, SiO2, target)

High Density CEO2 Target Cerium Oxide Sputtering Target for Deposition

358

High Density CEO2 Target Cerium Oxide Sputtering Target for Deposition

Sn Target Stannum Sputtering Target for Optical Filter/Solar Photovoltaics

487

Sn Target Stannum Sputtering Target for Optical Filter/Solar Photovoltaics

W Target Tungsten Sputtering Target for Semiconductor /Memory Chips

499

W Target Tungsten Sputtering Target for Semiconductor /Memory Chips

Sputtering Target

283

Sputtering Target

Aluminum Plate Sputtering Target for Magnetron Coating

329

Aluminum Plate Sputtering Target for Magnetron Coating

NiV Alloy Target Nickel Vanadium Alloy Sputtering Target for LCD/Semiconductor

396

NiV Alloy Target Nickel Vanadium Alloy Sputtering Target for LCD/Semiconductor

Zrb2 PVD Target with 99.5% Purity

495

Zrb2 PVD Target with 99.5% Purity

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