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Nickel Target 99.99 High Purity Sputtering Plane Target

304

Nickel Target 99.99 High Purity Sputtering Plane Target

U-Spring Tial Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

313

U-Spring Tial Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Cr Target Chromium Sputtering Target for Decoration Film Coating

496

Cr Target Chromium Sputtering Target for Decoration Film Coating

High Purity Gold Sputtering Target Material Custom Processing

253

High Purity Gold Sputtering Target Material Custom Processing

U-Spring Zirconium / Zr Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

411

U-Spring Zirconium / Zr Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Titanium Aluminum Alloy Sputtering Coating Target Tial Alloy Target, Ticr Alloy Target, Alloy Target

350

Titanium Aluminum Alloy Sputtering Coating Target Tial Alloy Target, Ticr Alloy Target, Alloy Target

Xinkang High Purity 99.99% Hzo (HfO2/ZrO2) Ceramic Sputtering Target for Vacuum Coating

455

Xinkang High Purity 99.99% Hzo (HfO2/ZrO2) Ceramic Sputtering Target for Vacuum Coating

99.99% High Purity Chromium Target Coating Material

417

99.99% High Purity Chromium Target Coating Material

Ta Target Tantalum Sputtering Target/Tantalum Rotary Target for Semiconductor

367

Ta Target Tantalum Sputtering Target/Tantalum Rotary Target for Semiconductor

U-Spring Nb2ox Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

304

U-Spring Nb2ox Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

99.999%High Pure Copper Target (4N-6N) Copper Plate Copper Sputtering Coating Target

408

99.999%High Pure Copper Target (4N-6N) Copper Plate Copper Sputtering Coating Target

AlNd Target Aluminium Neodymium Alloy Sputtering Target for LCD/Touch Panel

423

AlNd Target Aluminium Neodymium Alloy Sputtering Target for LCD/Touch Panel

U-Spring Tiox Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

360

U-Spring Tiox Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

High Purity 99.999% Titanium Sputtering Coatingtarget

452

High Purity 99.999% Titanium Sputtering Coatingtarget

U-Spring Monb Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

372

U-Spring Monb Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Titanium Aluminum Alloy Targets/Titanium Sputtering Targets/Tial Alloy Target

485

Titanium Aluminum Alloy Targets/Titanium Sputtering Targets/Tial Alloy Target

Nb2O5 Target Nb2Ox Niobium Oxide Ceramic Target for Optical Thin Film Coating/Semiconductor

355

Nb2O5 Target Nb2Ox Niobium Oxide Ceramic Target for Optical Thin Film Coating/Semiconductor

U-Spring C Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

278

U-Spring C Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

U-Spring Si/Silicon Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

326

U-Spring Si/Silicon Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

3-5mm Chromium Particles Cr Granule with a Minimum Content of 99.95%

509

3-5mm Chromium Particles Cr Granule with a Minimum Content of 99.95%

SnO2 Target Tin Oxide Ceramic Target for Semiconductor

482

SnO2 Target Tin Oxide Ceramic Target for Semiconductor

U-Spring Mo/Molybdenum Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

289

U-Spring Mo/Molybdenum Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

ZnTe Target Zinc Telluride Ceramic Target for Semiconductor

334

ZnTe Target Zinc Telluride Ceramic Target for Semiconductor

99.99% Platinum Vacuum Coating Sputtering Target 8 Inch

285

99.99% Platinum Vacuum Coating Sputtering Target 8 Inch

U-Spring Al Alloy Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

245

U-Spring Al Alloy Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Zrb2 PVD Target with 99.5% Purity

495

Zrb2 PVD Target with 99.5% Purity

GeTeSnIn Target Getesbin Germanium Antimony Telluride Indium Alloy Target for Memory Chips/Integrated Circuits

318

GeTeSnIn Target Getesbin Germanium Antimony Telluride Indium Alloy Target for Memory Chips/Integrated Circuits

U-Spring Nicr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

384

U-Spring Nicr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Sputtering Target

283

Sputtering Target

Aluminum Plate Sputtering Target for Magnetron Coating

331

Aluminum Plate Sputtering Target for Magnetron Coating

NiV Alloy Target Nickel Vanadium Alloy Sputtering Target for LCD/Semiconductor

396

NiV Alloy Target Nickel Vanadium Alloy Sputtering Target for LCD/Semiconductor

U-Spring CrAl Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

363

U-Spring CrAl Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

W Target Tungsten Sputtering Target for Semiconductor /Memory Chips

501

W Target Tungsten Sputtering Target for Semiconductor /Memory Chips

U-Spring Tial Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

449

U-Spring Tial Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

99.9999%Single Crystal Silicon Target (Si target, SiO2, target)

493

99.9999%Single Crystal Silicon Target (Si target, SiO2, target)

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