MadeInChina.com > Video> Metallurgy, Mineral & Energy > Target Material

U-Spring Ti Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Name: U-Spring Ti Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating
Uploaded: 2025-03-25T01:02:46+08:00

2025-04-09 2300IP Unknown

U-Spring Ti Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating
330 views

U-Spring Cu Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating
485 views

U-Spring Ti Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating
230 views

U-Spring Cr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating
356 views

U-Spring Tiox Rotary Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating
250 views

Product Specifications

Model NO.:

U-Spring Ti Planar Target

Type:

Metal Target

Shape:

Plate

Certification:

ISO

Inner Packing:

Pack by Vacuumed Bag and Wrap with PE Foam

Outer Packing:

Cover with Foam Then Load Into Plywood Box

Application:

Coating

Length:

0~4300mm

Trademark:

U-Spring

Transport Package:

Plywood Box

Specification:

According to customer

Origin:

Xiamen, China

You May Like: Sputtering Target, Spraying Target, Rotary Target, Target, Coating, Metal, Ti, Melting, Sintering, Semiconductor Separation Device Ti Target, Flat Display Ti Target, Storage Electrode Film Ti Target, Sputtering Coating Ti Target, Workpiece Surface Coating Ti Target, Glass Coating Industry Target, Cathodes Arc Target, Cathodes Target, Titanium, Titanium Target

Like 0 Dislike 0 Comment 0

More>Recommended Video

U-Spring Chromium / Cr Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

295

U-Spring Chromium / Cr Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

NdFeB Target Neodymium Ferrum Boron Alloy Sputtering Target For Magnetic Drive

450

NdFeB Target Neodymium Ferrum Boron Alloy Sputtering Target For Magnetic Drive

U-Spring Aluminum / Al Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

200

U-Spring Aluminum / Al Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Mono-Si Target Monocrystalline Silicon Ceramic Granules Target for Sputtering Target/Mobile Phone

341

Mono-Si Target Monocrystalline Silicon Ceramic Granules Target for Sputtering Target/Mobile Phone

U-Spring Nickel / Ni Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

269

U-Spring Nickel / Ni Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Monocrystalline Silicon Ceramic Bonding Target for Sputtering Target/Mobile Phone

452

Monocrystalline Silicon Ceramic Bonding Target for Sputtering Target/Mobile Phone

U-Spring Tial Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

415

U-Spring Tial Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Low Price and High-Quality Nickel Powder 99.99% Metal Powder

364

Low Price and High-Quality Nickel Powder 99.99% Metal Powder

GeSe Target Germanium Selenium Alloy Target for Memory Chips/Integrated Circuits

473

GeSe Target Germanium Selenium Alloy Target for Memory Chips/Integrated Circuits

U-Spring CrAl Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

335

U-Spring CrAl Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

Bi Target Bismuth Sputtering Target for Semiconductor

471

Bi Target Bismuth Sputtering Target for Semiconductor

U-Spring Nicr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

353

U-Spring Nicr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating