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Dual-Target RF Magnetron Sputtering Vacuum PVD Coating Machine for Semiconductor Films Video,Demo, How It Works & Features

Name: Dual-Target RF Magnetron Sputtering Vacuum PVD Coating Machine for Semiconductor Films
Uploaded: 2025-12-28T15:19:32+08:00

2025-04-09 2630

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Product Specifications

Model NO.:

TN-MSP300H-RFRF

After-sales Service:

12 Months

Warranty:

12 Months

Type:

Coating Production Line

Coating:

Vacuum Coating

Substrate:

Steel

Certification:

Condition:

New

Cooling Mode:

Water Cooling

Heating Temperature:

Max 500°c

Rotate Speed:

1-20rpm Adjustable

Substrate Size:

Diameter 185mm

Vacuum Chamber:

Stainless Steel

Magnetron Sputtering Target Head:

2 Magnetron Sputtering Heads

Sample Stage Size:

Maximum 4" Substrate Can Be Placed

Rotated Speed:

1-20 Rpm (Adjustable)

Temperature Control Accuracy:

+/- 1.0 °c

Gas Flow Controller:

2 Mass Flow Meters Installed Inside The Instrument

Vacuum Pump:

a Set of Molecular Pump System, Using One-Button O

Cooling System:

16L/Min.

Trademark:

Transport Package:

Fumigated Wooden Box

Specification:

290mmx365mmx260mm

Origin:

China

HS Code:

8486209000

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