Xinkang High Purity 99.99% Hzo (HfO2/ZrO2) Ceramic Sputtering Target for Vacuum Coating

2025-04-09 4310IP Unknown

Product Specifications

XK-HZO 01
Ceramic Target
Round
ISO
1PC Vacuum Package
99.9%-99.99%
Customized
15-18days
ISO9001:2015
1PC
Target, Wire, Segment, Granule, Ingot, Sheet
XinKang
Vacuum Inside, Carton or Wooden Case Outside
1''-8'', or as per your request
China
8007009000
You May Like: Hzo Ceramic Target, High Purity Hafnium Oxide Zirconium Oxide Target, High Density Hzo Ceramic Target, Hzo Bongding Copper Backing Plate
Dislike 0 Comment 0
More>Recommended Video
U-Spring Chromium / Cr Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

295

NdFeB Target Neodymium Ferrum Boron Alloy Sputtering Target For Magnetic Drive

450

U-Spring Aluminum / Al Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

200

Mono-Si Target Monocrystalline Silicon Ceramic Granules Target for Sputtering Target/Mobile Phone

341

U-Spring Nickel / Ni Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

269

Monocrystalline Silicon Ceramic Bonding Target for Sputtering Target/Mobile Phone

452

U-Spring Tial Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

415

Low Price and High-Quality Nickel Powder 99.99% Metal Powder

364

GeSe Target Germanium Selenium Alloy Target for Memory Chips/Integrated Circuits

473

U-Spring CrAl Cathodes Arc Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

335

Bi Target Bismuth Sputtering Target for Semiconductor

471

U-Spring Nicr Planar Target / Sputtering Target for Magnetron Sputtering & Vacuum Coating

353