Dual-Target RF Magnetron Sputtering Vacuum PVD Coating Machine for Semiconductor Films Video, Demo, How It Works & Features
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Product Specifications
Model NO.:
TN-MSP300H-RFRF
After-sales Service:
12 Months
Warranty:
12 Months
Type:
Coating Production Line
Coating:
Vacuum Coating
Substrate:
Steel
Certification:
CE
Condition:
New
Cooling Mode:
Water Cooling
Heating Temperature:
Max 500°c
Rotate Speed:
1-20rpm Adjustable
Substrate Size:
Diameter 185mm
Vacuum Chamber:
Stainless Steel
Magnetron Sputtering Target Head:
2 Magnetron Sputtering Heads
Sample Stage Size:
Maximum 4" Substrate Can Be Placed
Rotated Speed:
1-20 Rpm (Adjustable)
Temperature Control Accuracy:
+/- 1.0 °c
Gas Flow Controller:
2 Mass Flow Meters Installed Inside The Instrument
Vacuum Pump:
a Set of Molecular Pump System, Using One-Button O
Cooling System:
16L/Min.
Trademark:
TN
Transport Package:
Fumigated Wooden Box
Specification:
290mmx365mmx260mm
Origin:
China
HS Code:
8486209000