99.999% Hige Purity Silicon Target, Sprayed Sial Alloy Target

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Zhongzheng Yejin Technology Co., Ltd.

VIP   Audited Supplier 9 years
Profile Certified by SGS/BV
  • Guangdong, China
  • Max (Ms.)  
Silicon ingot, rod, piece, tube, ring
Cylinder, Plane
Discrete Device
High Purity Silicon
Wooden Box Vacuum
Product Description


1.Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,
 
2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material


2.Our Sputtering Target Products :
MaterialsTypeProductShape
ceramicSisilicon sputtering targetrotarable 
NbOxNiobium Oxide sputtering targetrotarable 
TiOxTitanium Oxide sputtering targetrotarable 
AZOAlumina doped zinc oxide sputtering targetrotarable/ planar
ITOIndium Tin Oxide sputtering targetrotarable
metalMoMolybdenum sputtering targetrotarable/ planar
CrCr Rotary Sputtering targetrotarable 
SnStannum sputterig targetrotarable
alloySiAlSiAl sputtering targetrotarable 
NiCrNickle chromium sputtering targetrotarable/ planar
ZnSnZinc Stannum sputtering targetrotarable
ZnAlZinc Aluminum sputtering targetrotarable
CuInGaCuInGa sputtering targetrotarable


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